Publication:

Scaling and readiness of underlayers for high-NA EUV lithography

Date

2022
Proceedings Paper
https://doi.org/10.1117/12.2645864
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Published version 884.42 KB

Author(s)

Fallica, Roberto  
;
De Simone, Danilo  
;
Chen, Steven
;
Safdar, Muhammad  
;
Suh, Hyo Seon  

Journal

Proceedings of SPIE

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936 since deposited on 2023-03-22
35last month
4last week
Acq. date: 2026-03-16

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1325 since deposited on 2023-03-22
Acq. date: 2026-03-16

Citations