Publication:

Scaling and readiness of underlayers for high-NA EUV lithography

Date

2022
Proceedings Paper
https://doi.org/10.1117/12.2645864
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dc.contributor.authorFallica, Roberto
dc.contributor.authorDe Simone, Danilo
dc.contributor.authorChen, Steven
dc.contributor.authorSafdar, Muhammad
dc.contributor.authorSuh, Hyo Seon
dc.contributor.imecauthorFallica, Roberto
dc.contributor.imecauthorDe Simone, Danilo
dc.contributor.imecauthorChen, Steven
dc.contributor.imecauthorSafdar, Muhammad
dc.contributor.imecauthorSuh, Hyo Seon
dc.contributor.orcidimecFallica, Roberto::0000-0003-4523-9624
dc.contributor.orcidimecDe Simone, Danilo::0000-0003-3927-5207
dc.date.accessioned2023-05-24T08:38:25Z
dc.date.available2023-03-22T03:40:58Z
dc.date.available2023-05-24T08:38:25Z
dc.date.embargo2022-12-01
dc.date.issued2022
dc.identifier.doi10.1117/12.2645864
dc.identifier.eisbn978-1-5106-5640-6
dc.identifier.issn0277-786X
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/41329
dc.publisherSPIE-INT SOC OPTICAL ENGINEERING
dc.source.beginpage122920V
dc.source.conferenceInternational Conference on Extreme Ultraviolet Lithography
dc.source.conferencedateSEP 26-29, 2022
dc.source.conferencelocationMonterey
dc.source.journalProceedings of SPIE
dc.source.numberofpages8
dc.source.volume12292
dc.subject.keywordsGROWTH
dc.title

Scaling and readiness of underlayers for high-NA EUV lithography

dc.typeProceedings paper
dspace.entity.typePublication
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