Publication:
Low-temperature epitaxial SiGe:P for gate-all-around n-channel metal-oxide-semiconductor devices
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120 since deposited on 2024-09-29
2last month
Acq. date: 2026-04-07
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Statistics
Views
120 since deposited on 2024-09-29
2last month
Acq. date: 2026-04-07
Citations