Publication:
TEM characterization of extended defects induced in Si wafers by H-plasma treatment
Date
| dc.contributor.author | Ghica, C. | |
| dc.contributor.author | Nistor, L.C. | |
| dc.contributor.author | Bender, Hugo | |
| dc.contributor.author | Richard, Olivier | |
| dc.contributor.author | Van Tendeloo, G. | |
| dc.contributor.author | Ulyashin, A. | |
| dc.contributor.imecauthor | Bender, Hugo | |
| dc.contributor.imecauthor | Richard, Olivier | |
| dc.contributor.orcidimec | Richard, Olivier::0000-0002-3994-8021 | |
| dc.date.accessioned | 2021-10-16T16:15:35Z | |
| dc.date.available | 2021-10-16T16:15:35Z | |
| dc.date.issued | 2007-01 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/12192 | |
| dc.source.beginpage | 395 | |
| dc.source.endpage | 400 | |
| dc.source.journal | Journal of Physics D: Applied Physics | |
| dc.source.volume | 40 | |
| dc.title | TEM characterization of extended defects induced in Si wafers by H-plasma treatment | |
| dc.type | Journal article | |
| dspace.entity.type | Publication | |
| Files | ||
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