Publication:

Using machine learning algorithms on review sem images to understand stochastic behaviour of EUV based patterning for n7 and smaller nodes

Date

2018
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dc.contributor.authorHalder, Sandip
dc.contributor.authorCerbu, Dorin
dc.contributor.authorLeray, Philippe
dc.contributor.imecauthorHalder, Sandip
dc.contributor.imecauthorCerbu, Dorin
dc.contributor.imecauthorLeray, Philippe
dc.contributor.orcidimecHalder, Sandip::0000-0002-6314-2685
dc.date.accessioned2021-10-25T19:28:01Z
dc.date.available2021-10-25T19:28:01Z
dc.date.issued2018
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/30837
dc.identifier.urlhttps://spie.org/PUV18/conferencedetails/international-conference-extreme-ultraviolet-lithography
dc.source.conferenceSPIE International Conference on Extreme Ultraviolet Lithography 2018
dc.source.conferencedate15/09/2018
dc.source.conferencelocationMonterey, CA USA
dc.title

Using machine learning algorithms on review sem images to understand stochastic behaviour of EUV based patterning for n7 and smaller nodes

dc.typeOral presentation
dspace.entity.typePublication
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