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Extreme-Ultraviolet-Lithography Line-Space Patterning Defect Detection Using Voltage Contrast SEM
Publication:
Extreme-Ultraviolet-Lithography Line-Space Patterning Defect Detection Using Voltage Contrast SEM
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Date
2025
Proceedings Paper
https://doi.org/10.1117/12.3049337
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Hasan, Mahmudul
;
Dey, Bappaditya
;
Blanco, Victor
;
Beral, Christophe
;
Charley, Anne-Laure
Journal
Proceedings of SPIE
Abstract
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49
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Acq. date: 2026-01-06
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Metrics
Views
49
since deposited on 2025-07-28
3
last month
2
last week
Acq. date: 2026-01-06
Citations