Publication:
Extreme-Ultraviolet-Lithography Line-Space Patterning Defect Detection Using Voltage Contrast SEM
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| cris.virtual.orcid | 0000-0003-4745-0167 | |
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| cris.virtualsource.orcid | 5ce755b6-7aea-44b8-9603-179aa300e12d | |
| dc.contributor.author | Hasan, Mahmudul | |
| dc.contributor.author | Dey, Bappaditya | |
| dc.contributor.author | Blanco, Victor | |
| dc.contributor.author | Beral, Christophe | |
| dc.contributor.author | Charley, Anne-Laure | |
| dc.contributor.imecauthor | Hasan, Mahmudul | |
| dc.contributor.imecauthor | Dey, Bappaditya | |
| dc.contributor.imecauthor | Blanco, Victor | |
| dc.contributor.imecauthor | Beral, Christophe | |
| dc.contributor.imecauthor | Charley, Anne-Laure | |
| dc.contributor.orcidimec | Dey, Bappaditya::0000-0002-0886-137X | |
| dc.contributor.orcidimec | Blanco, Victor::0000-0003-4308-0381 | |
| dc.contributor.orcidimec | Beral, Christophe::0000-0003-1356-9186 | |
| dc.contributor.orcidimec | Charley, Anne-Laure::0000-0003-4745-0167 | |
| dc.date.accessioned | 2025-07-28T03:57:29Z | |
| dc.date.available | 2025-07-28T03:57:29Z | |
| dc.date.issued | 2025 | |
| dc.identifier.doi | 10.1117/12.3049337 | |
| dc.identifier.eisbn | 978-1-5106-8639-7 | |
| dc.identifier.isbn | 978-1-5106-8638-0 | |
| dc.identifier.issn | 0277-786X | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/45959 | |
| dc.publisher | SPIE-INT SOC OPTICAL ENGINEERING | |
| dc.source.beginpage | 134260P-1 | |
| dc.source.conference | 2025 Conference on Metrology Inspection and Process Control-Annual | |
| dc.source.conferencedate | 2025-02-24 | |
| dc.source.conferencelocation | San Jose | |
| dc.source.endpage | 134260P-7 | |
| dc.source.journal | Proceedings of SPIE | |
| dc.source.numberofpages | 7 | |
| dc.title | Extreme-Ultraviolet-Lithography Line-Space Patterning Defect Detection Using Voltage Contrast SEM | |
| dc.type | Proceedings paper | |
| dspace.entity.type | Publication | |
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