Publication:

Extreme-Ultraviolet-Lithography Line-Space Patterning Defect Detection Using Voltage Contrast SEM

Date

2025
Proceedings Paper
https://doi.org/10.1117/12.3049337
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dc.contributor.authorHasan, Mahmudul
dc.contributor.authorDey, Bappaditya
dc.contributor.authorBlanco, Victor
dc.contributor.authorBeral, Christophe
dc.contributor.authorCharley, Anne-Laure
dc.contributor.imecauthorHasan, Mahmudul
dc.contributor.imecauthorDey, Bappaditya
dc.contributor.imecauthorBlanco, Victor
dc.contributor.imecauthorBeral, Christophe
dc.contributor.imecauthorCharley, Anne-Laure
dc.contributor.orcidimecDey, Bappaditya::0000-0002-0886-137X
dc.contributor.orcidimecBlanco, Victor::0000-0003-4308-0381
dc.contributor.orcidimecBeral, Christophe::0000-0003-1356-9186
dc.contributor.orcidimecCharley, Anne-Laure::0000-0003-4745-0167
dc.date.accessioned2025-07-28T03:57:29Z
dc.date.available2025-07-28T03:57:29Z
dc.date.issued2025
dc.identifier.doi10.1117/12.3049337
dc.identifier.eisbn978-1-5106-8639-7
dc.identifier.isbn978-1-5106-8638-0
dc.identifier.issn0277-786X
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/45959
dc.publisherSPIE-INT SOC OPTICAL ENGINEERING
dc.source.beginpage134260P-1
dc.source.conference2025 Conference on Metrology Inspection and Process Control-Annual
dc.source.conferencedate2025-02-24
dc.source.conferencelocationSan Jose
dc.source.endpage134260P-7
dc.source.journalProceedings of SPIE
dc.source.numberofpages7
dc.title

Extreme-Ultraviolet-Lithography Line-Space Patterning Defect Detection Using Voltage Contrast SEM

dc.typeProceedings paper
dspace.entity.typePublication
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