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Advances in low temperature processing of silicon nitride based dielectrics and their applications in surface passivation and integrated optical devices

Date

2000
Journal article
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dc.contributor.authorAgnihotri, Om Prakash
dc.contributor.authorJain, Suresh
dc.contributor.authorPoortmans, Jef
dc.contributor.authorSzlufcik, Jozef
dc.contributor.authorBeaucarne, Guy
dc.contributor.authorNijs, Johan
dc.contributor.authorMertens, Robert
dc.contributor.imecauthorPoortmans, Jef
dc.contributor.imecauthorSzlufcik, Jozef
dc.contributor.imecauthorMertens, Robert
dc.contributor.orcidimecPoortmans, Jef::0000-0003-2077-2545
dc.date.accessioned2021-10-14T12:39:44Z
dc.date.available2021-10-14T12:39:44Z
dc.date.embargo9999-12-31
dc.date.issued2000
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/4061
dc.source.beginpageR29
dc.source.endpageR40
dc.source.issue7
dc.source.journalSemiconductor Science and Technology
dc.source.volume15
dc.title

Advances in low temperature processing of silicon nitride based dielectrics and their applications in surface passivation and integrated optical devices

dc.typeJournal article
dspace.entity.typePublication
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