Publication:

Successful selective epitaxial Si1-xGex deposition process for HBT-BiCMOS and high-mobility hetero-channel pMOS applications

Date

2003
Journal article
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dc.contributor.authorLoo, Roger
dc.contributor.authorCaymax, Matty
dc.contributor.authorPeytier, Ivan
dc.contributor.authorDecoutere, Stefaan
dc.contributor.authorCollaert, Nadine
dc.contributor.authorVerheyen, Peter
dc.contributor.authorVandervorst, Wilfried
dc.contributor.authorDe Meyer, Kristin
dc.contributor.imecauthorLoo, Roger
dc.contributor.imecauthorCaymax, Matty
dc.contributor.imecauthorDecoutere, Stefaan
dc.contributor.imecauthorCollaert, Nadine
dc.contributor.imecauthorVerheyen, Peter
dc.contributor.imecauthorVandervorst, Wilfried
dc.contributor.imecauthorDe Meyer, Kristin
dc.contributor.orcidimecLoo, Roger::0000-0003-3513-6058
dc.contributor.orcidimecDecoutere, Stefaan::0000-0001-6632-6239
dc.contributor.orcidimecCollaert, Nadine::0000-0002-8062-3165
dc.date.accessioned2021-10-15T05:26:59Z
dc.date.available2021-10-15T05:26:59Z
dc.date.issued2003
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/7819
dc.source.beginpageG638
dc.source.endpageG647
dc.source.issue10
dc.source.journalJournal of Electrochemical Society
dc.source.volume150
dc.title

Successful selective epitaxial Si1-xGex deposition process for HBT-BiCMOS and high-mobility hetero-channel pMOS applications

dc.typeJournal article
dspace.entity.typePublication
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