Skip to content
Institutional repository
Communities & Collections
Browse all items
Scientific publications
Open knowledge
Log In
imec Publications
Articles
Ru/Ta bilayer approach to EUV mask absorbers: Experimental patterning and simulated imaging perspective
Publication:
Ru/Ta bilayer approach to EUV mask absorbers: Experimental patterning and simulated imaging perspective
Copy permalink
Date
2023
Journal article
https://doi.org/10.1016/j.mne.2023.100223
Simple item page
Full metadata
Statistics
Loading...
Loading...
Files
Published version
9.57 MB
Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Thakare, Devesh
;
de Marneffe, Jean-Francois
;
Delabie, Annelies
;
Philipsen, Vicky
Journal
MICRO AND NANO ENGINEERING
Abstract
Description
Metrics
Downloads
854
since deposited on 2023-10-07
216
last month
42
last week
Acq. date: 2025-12-15
Views
917
since deposited on 2023-10-07
Acq. date: 2025-12-15
Citations
Metrics
Downloads
854
since deposited on 2023-10-07
216
last month
42
last week
Acq. date: 2025-12-15
Views
917
since deposited on 2023-10-07
Acq. date: 2025-12-15
Citations