Publication:

Ru/Ta bilayer approach to EUV mask absorbers: Experimental patterning and simulated imaging perspective

Date

2023
Journal article
https://doi.org/10.1016/j.mne.2023.100223
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dc.contributor.authorThakare, Devesh
dc.contributor.authorde Marneffe, Jean-Francois
dc.contributor.authorDelabie, Annelies
dc.contributor.authorPhilipsen, Vicky
dc.contributor.imecauthorThakare, Devesh
dc.contributor.imecauthorde Marneffe, Jean-Francois
dc.contributor.imecauthorDelabie, Annelies
dc.contributor.imecauthorPhilipsen, Vicky
dc.contributor.orcidimecThakare, Devesh::0000-0003-3265-7042
dc.contributor.orcidimecde Marneffe, Jean-Francois::0000-0001-5178-6670
dc.contributor.orcidimecDelabie, Annelies::0000-0001-9739-7419
dc.contributor.orcidimecPhilipsen, Vicky::0000-0002-2959-432X
dc.date.accessioned2024-03-18T13:00:27Z
dc.date.available2023-10-07T17:32:42Z
dc.date.available2024-03-18T13:00:27Z
dc.date.embargo2023-09-30
dc.date.issued2023
dc.identifier.doi10.1016/j.mne.2023.100223
dc.identifier.issn2590-0072
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/42662
dc.publisherELSEVIER
dc.source.beginpageArt.10223
dc.source.endpageN/A
dc.source.issueSeptember
dc.source.journalMICRO AND NANO ENGINEERING
dc.source.numberofpages21
dc.source.volume20
dc.subject.keywordsRU THIN-FILMS
dc.subject.keywordsETCHING MECHANISM
dc.subject.keywordsIMPROVEMENT
dc.subject.keywordsDEPOSITION
dc.subject.keywordsSTABILITY
dc.subject.keywordsRUTHENIUM
dc.subject.keywordsTA
dc.title

Ru/Ta bilayer approach to EUV mask absorbers: Experimental patterning and simulated imaging perspective

dc.typeJournal article
dspace.entity.typePublication
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