Publication:

Texture of atomic layer deposited ruthenium

Date

2010
Journal article
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dc.contributor.authorMusschoot, J.
dc.contributor.authorXie, Q.
dc.contributor.authorDeduytsche, D.
dc.contributor.authorDe Keyser, K.
dc.contributor.authorLongrie, D.
dc.contributor.authorHaemers, J.
dc.contributor.authorVan den Berghe, S.
dc.contributor.authorVan Meirhaeghe, R.L.
dc.contributor.authorD'Haen, Jan
dc.contributor.authorDetavernier, C.
dc.contributor.imecauthorD'Haen, Jan
dc.date.accessioned2021-10-18T19:22:50Z
dc.date.available2021-10-18T19:22:50Z
dc.date.embargo9999-12-31
dc.date.issued2010
dc.identifier.issn0167-9317
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/17666
dc.source.beginpage1879
dc.source.endpage1883
dc.source.issue10
dc.source.journalMicroelectronic Engineering
dc.source.volume87
dc.title

Texture of atomic layer deposited ruthenium

dc.typeJournal article
dspace.entity.typePublication
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