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Electromigration limits of copper nano-interconnects

 
dc.contributor.authorZahedmanesh, Houman
dc.contributor.authorVarela Pedreira, Olalla
dc.contributor.authorTokei, Zsolt
dc.contributor.authorCroes, Kristof
dc.contributor.imecauthorZahedmanesh, Houman
dc.contributor.imecauthorVarela Pedreira, Olalla
dc.contributor.imecauthorTokei, Zsolt
dc.contributor.imecauthorCroes, Kristof
dc.contributor.orcidimecCroes, Kristof::0000-0002-3955-0638
dc.date.accessioned2022-03-11T14:53:07Z
dc.date.available2022-03-11T14:53:07Z
dc.date.issued2021
dc.identifier.doi10.1109/IRPS46558.2021.9405091
dc.identifier.eisbn978-1-7281-6893-7
dc.identifier.issn1541-7026
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/39427
dc.publisherIEEE
dc.source.conferenceIEEE International Reliability Physics Symposium (IRPS)
dc.source.conferencedateMAR 21-24, 2021
dc.source.conferencelocationVirtual
dc.source.journalna
dc.source.numberofpages6
dc.title

Electromigration limits of copper nano-interconnects

dc.typeProceedings paper
dspace.entity.typePublication
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