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Articles
Stitching insights towards high numerical aperture extreme ultraviolet lithography: an experimental study
Publication:
Stitching insights towards high numerical aperture extreme ultraviolet lithography: an experimental study
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Date
2025-JAN 1
Journal article
https://doi.org/10.1117/1.JMM.24.1.011012
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Wiaux, Vincent
;
Davydova, Natalia
;
Van Look, Lieve
;
Pellens, Nick
;
Weldeslassie, Ataklti
;
Libeert, Guillaume
;
Kovalevich, Tatiana
;
Bekaert, Joost
;
Timmermans, Frank
;
Tabery, Cyrus
;
Huddleston, Laura
Journal
JOURNAL OF MICRO-NANOPATTERNING MATERIALS AND METROLOGY-JM3
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114
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Acq. date: 2026-01-07
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Views
114
since deposited on 2025-05-17
4
last month
1
last week
Acq. date: 2026-01-07
Citations