Publication:

Stitching insights towards high numerical aperture extreme ultraviolet lithography: an experimental study

Date

2025-JAN 1
Journal article
https://doi.org/10.1117/1.JMM.24.1.011012
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dc.contributor.authorWiaux, Vincent
dc.contributor.authorDavydova, Natalia
dc.contributor.authorVan Look, Lieve
dc.contributor.authorPellens, Nick
dc.contributor.authorWeldeslassie, Ataklti
dc.contributor.authorLibeert, Guillaume
dc.contributor.authorKovalevich, Tatiana
dc.contributor.authorBekaert, Joost
dc.contributor.authorTimmermans, Frank
dc.contributor.authorTabery, Cyrus
dc.contributor.authorHuddleston, Laura
dc.contributor.imecauthorWiaux, Vincent
dc.contributor.imecauthorVan Look, Lieve
dc.contributor.imecauthorPellens, Nick
dc.contributor.imecauthorWeldeslassie, Ataklti
dc.contributor.imecauthorLibeert, Guillaume
dc.contributor.imecauthorKovalevich, Tatiana
dc.contributor.imecauthorBekaert, Joost
dc.contributor.orcidimecWiaux, Vincent::0000-0002-8923-5708
dc.contributor.orcidimecVan Look, Lieve::0009-0000-6198-024X
dc.contributor.orcidimecPellens, Nick::0000-0001-5527-5130
dc.contributor.orcidimecLibeert, Guillaume::0000-0003-1392-5371
dc.contributor.orcidimecKovalevich, Tatiana::0000-0001-9633-8257
dc.contributor.orcidimecBekaert, Joost::0000-0003-3075-3479
dc.date.accessioned2025-05-17T05:44:53Z
dc.date.available2025-05-17T05:44:53Z
dc.date.issued2025-JAN 1
dc.identifier.doi10.1117/1.JMM.24.1.011012
dc.identifier.issn1932-5150
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/45672
dc.publisherSPIE-SOC PHOTO-OPTICAL INSTRUMENTATION ENGINEERS
dc.source.issue1
dc.source.journalJOURNAL OF MICRO-NANOPATTERNING MATERIALS AND METROLOGY-JM3
dc.source.numberofpages20
dc.source.volume24
dc.title

Stitching insights towards high numerical aperture extreme ultraviolet lithography: an experimental study

dc.typeJournal article
dspace.entity.typePublication
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