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Articles
Low-frequency noise assessment of the oxide quality of gate-last high-k pMOSFETS
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Low-frequency noise assessment of the oxide quality of gate-last high-k pMOSFETS
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Date
2012
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Simoen, Eddy
;
Veloso, Anabela
;
Horiguchi, Naoto
;
Claeys, Cor
Journal
IEEE Electron Device Letters
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1812
since deposited on 2021-10-20
Acq. date: 2025-12-16
Citations
Metrics
Views
1812
since deposited on 2021-10-20
Acq. date: 2025-12-16
Citations