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Process development using negative tone development for the dark field critical layers in a 28 nm node process
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Process development using negative tone development for the dark field critical layers in a 28 nm node process
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Date
2012
Proceedings Paper
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Versluijs, Janko
;
Truffert, Vincent
;
Murdoch, Gayle
;
De Bisschop, Peter
;
Trivkovic, Darko
;
Wiaux, Vincent
;
Kunnen, Eddy
;
Souriau, Laurent
;
Demuynck, Steven
;
Ercken, Monique
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1956
since deposited on 2021-10-20
1
last month
Acq. date: 2026-01-10
Citations
Metrics
Views
1956
since deposited on 2021-10-20
1
last month
Acq. date: 2026-01-10
Citations