Publication:

High-performance Ge MOS capacitors by O2 plasma passivation and O2 ambient annealing

Date

2011

Journal article

Simple item page Full metadata Statistics

Files

23488.pdf 280.6 KB

Author(s)

;

;

Schaekers, Marc

;

;

;

Delabie, Annelies

;

;

;

Deduytsche, Davy

;

Detavemier, Christophe

Journal

IEEE Electron Device Letters

Statistics

1964 since deposited on 2021-10-19

Acq. date: 2026-10-02