Publication:
High-performance Ge MOS capacitors by O2 plasma passivation and O2 ambient annealing
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1964 since deposited on 2021-10-19
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Acq. date: 2026-08-07
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Statistics
Views
1964 since deposited on 2021-10-19
4last month
4last week
Acq. date: 2026-08-07
Citations