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High depth resolution depth profile analysis of ultra thin high-k Hf based films using MEIS compared with XTEM, XRF, SE and XPS

Date

2009
Meeting abstract
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dc.contributor.authorvan den Berg, J.A.
dc.contributor.authorReading, M.A.
dc.contributor.authorParisini, A.
dc.contributor.authorKolbe, M.
dc.contributor.authorBeckhoff, B.
dc.contributor.authorLadas, S.
dc.contributor.authorPetrik, P.
dc.contributor.authorBailey, P.
dc.contributor.authorNoakes, T.
dc.contributor.authorConard, Thierry
dc.contributor.authorDe Gendt, Stefan
dc.contributor.imecauthorConard, Thierry
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.orcidimecConard, Thierry::0000-0002-4298-5851
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.date.accessioned2021-10-18T03:59:58Z
dc.date.available2021-10-18T03:59:58Z
dc.date.embargo9999-12-31
dc.date.issued2009
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/16363
dc.source.beginpage1994
dc.source.conference216th ECS Meeting
dc.source.conferencedate4/10/2009
dc.source.conferencelocationVienna Austria
dc.title

High depth resolution depth profile analysis of ultra thin high-k Hf based films using MEIS compared with XTEM, XRF, SE and XPS

dc.typeMeeting abstract
dspace.entity.typePublication
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