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Island growth in the atomic layer deposition of zirconium oxide and aluminium oxide on hydrogen-terminated silicon: growth mode modelling and transmission electron microscopy

Date

2004
Journal article
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dc.contributor.authorPuurunen, Riikka
dc.contributor.authorVandervorst, Wilfried
dc.contributor.authorBesling, Wim F. A.
dc.contributor.authorRichard, Olivier
dc.contributor.authorBender, Hugo
dc.contributor.authorConard, Thierry
dc.contributor.authorZhao, Chao
dc.contributor.authorDelabie, Annelies
dc.contributor.authorCaymax, Matty
dc.contributor.authorDe Gendt, Stefan
dc.contributor.authorHeyns, Marc
dc.contributor.authorViitanen, M.M.
dc.contributor.authorDe Ridder, M.
dc.contributor.authorBrongersma, Hidde
dc.contributor.authorTamminga, Y.
dc.contributor.authorDao, T.
dc.contributor.authorde Win, T.
dc.contributor.authorVerheijen, M.
dc.contributor.authorKaiser, M.
dc.contributor.authorTuominen, M.
dc.contributor.imecauthorVandervorst, Wilfried
dc.contributor.imecauthorRichard, Olivier
dc.contributor.imecauthorBender, Hugo
dc.contributor.imecauthorConard, Thierry
dc.contributor.imecauthorDelabie, Annelies
dc.contributor.imecauthorCaymax, Matty
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.imecauthorHeyns, Marc
dc.contributor.orcidimecRichard, Olivier::0000-0002-3994-8021
dc.contributor.orcidimecConard, Thierry::0000-0002-4298-5851
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.date.accessioned2021-10-15T15:40:18Z
dc.date.available2021-10-15T15:40:18Z
dc.date.issued2004
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/9477
dc.source.beginpage4878
dc.source.endpage4889
dc.source.issue9
dc.source.journalJournal of Applied Physics
dc.source.volume96
dc.title

Island growth in the atomic layer deposition of zirconium oxide and aluminium oxide on hydrogen-terminated silicon: growth mode modelling and transmission electron microscopy

dc.typeJournal article
dspace.entity.typePublication
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