Overview of the kinetics of the early stages of electromigration under low (=realistic) current density stress

dc.contributor.author	Van Olmen, Jan
dc.contributor.author	Manca, Jean
dc.contributor.author	De Ceuninck, Ward
dc.contributor.author	De Schepper, Luc
dc.contributor.author	D'Haeger, V.
dc.contributor.author	Witvrouw, Ann
dc.contributor.author	Maex, Karen
dc.contributor.imecauthor	Van Olmen, Jan
dc.contributor.imecauthor	De Ceuninck, Ward
dc.contributor.imecauthor	Maex, Karen
dc.date.accessioned	2021-10-01T09:22:21Z
dc.date.available	2021-10-01T09:22:21Z
dc.date.embargo	9999-12-31
dc.date.issued	1998
dc.identifier.uri	https://imec-publications.be/handle/20.500.12860/3063
dc.source.beginpage	1009
dc.source.endpage	1014
dc.source.issue	6_8
dc.source.journal	Microelectronics Reliability
dc.source.volume	38
dc.title	Overview of the kinetics of the early stages of electromigration under low (=realistic) current density stress
dc.type	Journal article
dspace.entity.type	Publication
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