Publication:
Mitigating pattern collapse in high-resolution extreme ultraviolet lithography using the organic dry development rinse process
| dc.contributor.author | Heo, Seonggil | |
| dc.contributor.author | Baek, Seungjoo | |
| dc.contributor.author | Gupta, Mihir | |
| dc.contributor.author | Suh, Hyo Seon | |
| dc.contributor.author | Kato, Kodai | |
| dc.contributor.author | Takeda, Satoshi | |
| dc.contributor.author | Shibayama, Wataru | |
| dc.contributor.author | Sakamoto, Rikimaru | |
| dc.contributor.imecauthor | Heo, Seonggil | |
| dc.contributor.imecauthor | Baek, Seungjoo | |
| dc.contributor.imecauthor | Gupta, Mihir | |
| dc.contributor.imecauthor | Suh, Hyo Seon | |
| dc.contributor.orcidimec | Heo, Seonggil::0009-0007-1447-7183 | |
| dc.contributor.orcidimec | Gupta, Mihir::0000-0003-0286-7997 | |
| dc.contributor.orcidimec | Suh, Hyo Seon::0000-0003-4370-5062 | |
| dc.date.accessioned | 2025-06-19T10:16:48Z | |
| dc.date.available | 2024-10-12T18:13:36Z | |
| dc.date.available | 2025-06-19T10:16:48Z | |
| dc.date.issued | 2024 | |
| dc.identifier.doi | 10.1117/1.JMM.23.3.034603 | |
| dc.identifier.issn | 1932-5150 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/44632 | |
| dc.publisher | SPIE-SOC PHOTO-OPTICAL INSTRUMENTATION ENGINEERS | |
| dc.source.beginpage | Art. 034603 | |
| dc.source.endpage | N/A | |
| dc.source.issue | 3 | |
| dc.source.journal | JOURNAL OF MICRO-NANOPATTERNING MATERIALS AND METROLOGY-JM3 | |
| dc.source.numberofpages | 9 | |
| dc.source.volume | 23 | |
| dc.title | Mitigating pattern collapse in high-resolution extreme ultraviolet lithography using the organic dry development rinse process | |
| dc.type | Journal article | |
| dspace.entity.type | Publication | |
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