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Reliability and Variability-Aware DTCO Flow: Demonstration of Projections to N3 FinFET and Nanosheet Technologies
Publication:
Reliability and Variability-Aware DTCO Flow: Demonstration of Projections to N3 FinFET and Nanosheet Technologies
Date
2021
Proceedings Paper
https://doi.org/10.1109/IRPS46558.2021.9405172
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Rzepa, G.
;
Karner, M.
;
Baumgartner, O.
;
Strof, G.
;
Schanovsky, F.
;
Mitterbauer, F.
;
Kernstock, C.
;
Karner, H. W.
;
Stanojevic, Z.
;
Weckx, Pieter
;
Hellings, Geert
;
Claes, Dieter
;
Wu, Zhicheng
;
Xiang, Yang
;
Chiarella, Thomas
;
Parvais, Bertrand
;
Mitard, Jerome
;
Franco, Jacopo
;
Kaczer, Ben
;
Linten, Dimitri
Journal
na
Abstract
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1956
since deposited on 2022-03-11
Acq. date: 2025-10-23
Citations
Metrics
Views
1956
since deposited on 2022-03-11
Acq. date: 2025-10-23
Citations