Publication:
Ultralow gate leakage current density of Ge metal-oxide-semiconductor capacitor passivated by in situ N2 plasma pretreatment
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1992 since deposited on 2021-10-20
Acq. date: 2025-10-23
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1992 since deposited on 2021-10-20
Acq. date: 2025-10-23
Citations