Publication:
Ultralow gate leakage current density of Ge metal-oxide-semiconductor capacitor passivated by in situ N2 plasma pretreatment
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1995 since deposited on 2021-10-20
1last month
Acq. date: 2025-12-08
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Metrics
Views
1995 since deposited on 2021-10-20
1last month
Acq. date: 2025-12-08
Citations