Low Temperature Area Selective Atomic Layer Deposition of Ruthenium Dioxide Thin Films Using Polymers as Inhibition Layers

Poonkottil, Nithin; Rijckaert, Hannes; Rajendran, Khannan; Petit, Robin R.; Martin, Lisa I. D. J.; Van Thourhout, Dries; Van Driessche, Isabel; Detavernier, Christophe; Dendooven, Jolien

doi:10.1002/admi.202201934

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Low Temperature Area Selective Atomic Layer Deposition of Ruthenium Dioxide Thin Films Using Polymers as Inhibition Layers

Date

2023

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https://doi.org/10.1002/admi.202201934

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Martin, Lisa I. D. J.

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Van Thourhout, Dries

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Van Driessche, Isabel

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Detavernier, Christophe

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Dendooven, Jolien

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ADVANCED MATERIALS INTERFACES

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276 since deposited on 2023-03-17

Acq. date: 2026-06-21

1174 since deposited on 2023-03-17

Acq. date: 2026-06-21

Low Temperature Area Selective Atomic Layer Deposition of Ruthenium Dioxide Thin Films Using Polymers as Inhibition Layers

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