Publication:

Low Temperature Area Selective Atomic Layer Deposition of Ruthenium Dioxide Thin Films Using Polymers as Inhibition Layers

Date

2023
Journal article
https://doi.org/10.1002/admi.202201934
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dc.contributor.authorPoonkottil, Nithin
dc.contributor.authorRijckaert, Hannes
dc.contributor.authorRajendran, Khannan
dc.contributor.authorPetit, Robin R.
dc.contributor.authorMartin, Lisa I. D. J.
dc.contributor.authorVan Thourhout, Dries
dc.contributor.authorVan Driessche, Isabel
dc.contributor.authorDetavernier, Christophe
dc.contributor.authorDendooven, Jolien
dc.contributor.imecauthorRajendran, Khannan
dc.contributor.imecauthorVan Thourhout, Dries
dc.contributor.orcidimecVan Thourhout, Dries::0000-0003-0111-431X
dc.date.accessioned2023-07-24T15:01:05Z
dc.date.available2023-03-17T03:38:46Z
dc.date.available2023-07-24T15:01:05Z
dc.date.embargo2023-03-24
dc.date.issued2023
dc.description.wosFundingTextThis project has received funding from the European Union's Horizon 2020 research and innovation programme under the Marie Sklodowska-Curie grant agreement no. 765378. H.R. acknowledges support and funding as postdoctoral fellow fundamental research of the Research Foundation - Flanders (FWO) under grant number 1273621N.
dc.identifier.doi10.1002/admi.202201934
dc.identifier.issn2196-7350
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/41299
dc.publisherWILEY
dc.source.beginpageArt. 2201934
dc.source.endpagena
dc.source.issue9
dc.source.journalADVANCED MATERIALS INTERFACES
dc.source.numberofpages10
dc.source.volume10
dc.subject.keywordsSELF-ASSEMBLED-MONOLAYER
dc.subject.keywordsTITANIUM-DIOXIDE
dc.subject.keywordsRU
dc.subject.keywordsELECTROCATALYSIS
dc.subject.keywordsNANOPARTICLES
dc.subject.keywordsGROWTH
dc.subject.keywordsALD
dc.title

Low Temperature Area Selective Atomic Layer Deposition of Ruthenium Dioxide Thin Films Using Polymers as Inhibition Layers

dc.typeJournal article
dspace.entity.typePublication
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