Publication:

Optimizing EUV OPC Runtime and Pattern Fidelity in DRAM Manufacturing Using Memory OPC Flow

Date

2025
Proceedings Paper
https://doi.org/10.1117/12.3051007
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dc.contributor.authorDe Gong, Shu
dc.contributor.authorChen, Sheng Tse
dc.contributor.authorLiao, Chun Cheng
dc.contributor.authorHuang, Teng Yen
dc.contributor.authorMeng, Renyang
dc.contributor.authorYang, Kiho
dc.contributor.authorGillijns, Werner
dc.contributor.authorLin, Hsin-jung
dc.contributor.authorMa, Shou-yuan
dc.contributor.authorTsai, JenHsiang
dc.contributor.authorLin, Ling Chieh
dc.contributor.authorChou, Ryan
dc.contributor.authorBurbine, Andrew
dc.contributor.authorPearson, Alex
dc.contributor.authorZhang, Xima
dc.contributor.imecauthorMeng, Renyang
dc.contributor.imecauthorYang, Kiho
dc.contributor.imecauthorGillijns, Werner
dc.contributor.orcidimecMeng, Renyang::0009-0003-7321-0578
dc.contributor.orcidimecYang, Kiho::0009-0002-8866-4807
dc.contributor.orcidimecGillijns, Werner::0000-0002-2430-7360
dc.date.accessioned2025-07-31T03:59:32Z
dc.date.available2025-07-31T03:59:32Z
dc.date.issued2025
dc.identifier.doi10.1117/12.3051007
dc.identifier.eisbn978-1-5106-8641-0
dc.identifier.isbn978-1-5106-8640-3
dc.identifier.issn0277-786X
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/45978
dc.publisherSPIE-INT SOC OPTICAL ENGINEERING
dc.source.conference2025 Conference on Novel Patterning Technologies
dc.source.conferencedateFEB 24-27, 2025
dc.source.conferencelocationSan Jose
dc.source.numberofpages6
dc.source.volume13427
dc.title

Optimizing EUV OPC Runtime and Pattern Fidelity in DRAM Manufacturing Using Memory OPC Flow

dc.typeProceedings paper
dspace.entity.typePublication
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