Publication:
Optimizing EUV OPC Runtime and Pattern Fidelity in DRAM Manufacturing Using Memory OPC Flow
| cris.virtual.department | #PLACEHOLDER_PARENT_METADATA_VALUE# | |
| cris.virtual.department | #PLACEHOLDER_PARENT_METADATA_VALUE# | |
| cris.virtual.department | #PLACEHOLDER_PARENT_METADATA_VALUE# | |
| cris.virtual.orcid | 0000-0002-2430-7360 | |
| cris.virtual.orcid | 0009-0002-8866-4807 | |
| cris.virtual.orcid | 0009-0003-7321-0578 | |
| cris.virtualsource.department | 7a43e54d-9897-45de-884c-e7dcd19acb63 | |
| cris.virtualsource.department | c28de6c8-469a-49a8-af84-805187bc4a38 | |
| cris.virtualsource.department | d2e86c1b-77d9-4994-ba37-32ba4a0307ab | |
| cris.virtualsource.orcid | 7a43e54d-9897-45de-884c-e7dcd19acb63 | |
| cris.virtualsource.orcid | c28de6c8-469a-49a8-af84-805187bc4a38 | |
| cris.virtualsource.orcid | d2e86c1b-77d9-4994-ba37-32ba4a0307ab | |
| dc.contributor.author | De Gong, Shu | |
| dc.contributor.author | Chen, Sheng Tse | |
| dc.contributor.author | Liao, Chun Cheng | |
| dc.contributor.author | Huang, Teng Yen | |
| dc.contributor.author | Meng, Renyang | |
| dc.contributor.author | Yang, Kiho | |
| dc.contributor.author | Gillijns, Werner | |
| dc.contributor.author | Lin, Hsin-jung | |
| dc.contributor.author | Ma, Shou-yuan | |
| dc.contributor.author | Tsai, JenHsiang | |
| dc.contributor.author | Lin, Ling Chieh | |
| dc.contributor.author | Chou, Ryan | |
| dc.contributor.author | Burbine, Andrew | |
| dc.contributor.author | Pearson, Alex | |
| dc.contributor.author | Zhang, Xima | |
| dc.contributor.imecauthor | Meng, Renyang | |
| dc.contributor.imecauthor | Yang, Kiho | |
| dc.contributor.imecauthor | Gillijns, Werner | |
| dc.contributor.orcidimec | Meng, Renyang::0009-0003-7321-0578 | |
| dc.contributor.orcidimec | Yang, Kiho::0009-0002-8866-4807 | |
| dc.contributor.orcidimec | Gillijns, Werner::0000-0002-2430-7360 | |
| dc.date.accessioned | 2025-07-31T03:59:32Z | |
| dc.date.available | 2025-07-31T03:59:32Z | |
| dc.date.issued | 2025 | |
| dc.identifier.doi | 10.1117/12.3051007 | |
| dc.identifier.eisbn | 978-1-5106-8641-0 | |
| dc.identifier.isbn | 978-1-5106-8640-3 | |
| dc.identifier.issn | 0277-786X | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/45978 | |
| dc.publisher | SPIE-INT SOC OPTICAL ENGINEERING | |
| dc.source.beginpage | 134270Y-1 | |
| dc.source.conference | 2025 Conference on Novel Patterning Technologies | |
| dc.source.conferencedate | 2025-04-25 | |
| dc.source.conferencelocation | San Jose | |
| dc.source.endpage | 134270Y-6 | |
| dc.source.journal | Proceedings of SPIE | |
| dc.source.numberofpages | 6 | |
| dc.title | Optimizing EUV OPC Runtime and Pattern Fidelity in DRAM Manufacturing Using Memory OPC Flow | |
| dc.type | Proceedings paper | |
| dspace.entity.type | Publication | |
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