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Ultra thin hybrid floating gate and high-k dielectric as IGD enabler of highly scaled planar NAND flash technology
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Ultra thin hybrid floating gate and high-k dielectric as IGD enabler of highly scaled planar NAND flash technology
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Date
2012
Proceedings Paper
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25232.pdf
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Kar, Gouri Sankar
;
Breuil, Laurent
;
Blomme, Pieter
;
Hody, Hubert
;
Locorotondo, Sabrina
;
Jossart, Nico
;
Richard, Olivier
;
Bender, Hugo
;
Van den Bosch, Geert
;
Debusschere, Ingrid
;
Van Houdt, Jan
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1858
since deposited on 2021-10-20
Acq. date: 2025-12-15
Citations
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Views
1858
since deposited on 2021-10-20
Acq. date: 2025-12-15
Citations