Publication:

Ultra thin hybrid floating gate and high-k dielectric as IGD enabler of highly scaled planar NAND flash technology

Date

2012
Proceedings Paper
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dc.contributor.authorKar, Gouri Sankar
dc.contributor.authorBreuil, Laurent
dc.contributor.authorBlomme, Pieter
dc.contributor.authorHody, Hubert
dc.contributor.authorLocorotondo, Sabrina
dc.contributor.authorJossart, Nico
dc.contributor.authorRichard, Olivier
dc.contributor.authorBender, Hugo
dc.contributor.authorVan den Bosch, Geert
dc.contributor.authorDebusschere, Ingrid
dc.contributor.authorVan Houdt, Jan
dc.contributor.imecauthorKar, Gouri Sankar
dc.contributor.imecauthorBreuil, Laurent
dc.contributor.imecauthorBlomme, Pieter
dc.contributor.imecauthorHody, Hubert
dc.contributor.imecauthorLocorotondo, Sabrina
dc.contributor.imecauthorJossart, Nico
dc.contributor.imecauthorRichard, Olivier
dc.contributor.imecauthorBender, Hugo
dc.contributor.imecauthorVan den Bosch, Geert
dc.contributor.imecauthorDebusschere, Ingrid
dc.contributor.imecauthorVan Houdt, Jan
dc.contributor.orcidimecBreuil, Laurent::0000-0003-2869-1651
dc.contributor.orcidimecRichard, Olivier::0000-0002-3994-8021
dc.contributor.orcidimecVan den Bosch, Geert::0000-0001-9971-6954
dc.contributor.orcidimecVan Houdt, Jan::0000-0003-1381-6925
dc.date.accessioned2021-10-20T12:06:15Z
dc.date.available2021-10-20T12:06:15Z
dc.date.embargo9999-12-31
dc.date.issued2012
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/20905
dc.source.beginpage2.2
dc.source.conferenceInternational Electron Devices Meeting - IEDM
dc.source.conferencedate10/12/2012
dc.source.conferencelocationSan Francisco, CA USA
dc.title

Ultra thin hybrid floating gate and high-k dielectric as IGD enabler of highly scaled planar NAND flash technology

dc.typeProceedings paper
dspace.entity.typePublication
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