Publication:

Patterning challenges in 193i-based tip to tip in N5 interconnects

Date

2018
Proceedings Paper
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dc.contributor.authorBriggs, Basoene
dc.contributor.authorVersluijs, Janko
dc.contributor.authorBoemmels, Juergen
dc.contributor.authorWilson, Chris
dc.contributor.authorTokei, Zsolt
dc.contributor.authorMallik, Arindam
dc.contributor.authorSoethoudt, Job
dc.contributor.imecauthorBriggs, Basoene
dc.contributor.imecauthorVersluijs, Janko
dc.contributor.imecauthorBoemmels, Juergen
dc.contributor.imecauthorWilson, Chris
dc.contributor.imecauthorTokei, Zsolt
dc.contributor.imecauthorMallik, Arindam
dc.contributor.imecauthorSoethoudt, Job
dc.contributor.orcidimecMallik, Arindam::0000-0002-0742-9366
dc.date.accessioned2021-10-25T16:57:04Z
dc.date.available2021-10-25T16:57:04Z
dc.date.issued2018
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/30329
dc.identifier.urlhttps://ieeexplore.ieee.org/document/8369254
dc.source.beginpage1
dc.source.conference2018 China Semiconductor Technology International Conference (CSTIC)
dc.source.conferencedate11/03/2018
dc.source.conferencelocationShanghai China
dc.source.endpage4
dc.title

Patterning challenges in 193i-based tip to tip in N5 interconnects

dc.typeProceedings paper
dspace.entity.typePublication
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