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Effective mobility in FinFET structures with HfO2 and SiON gate dielectrics and TaN gate electrode
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Effective mobility in FinFET structures with HfO2 and SiON gate dielectrics and TaN gate electrode
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Date
2005
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Rudenko, Tamara
;
Collaert, Nadine
;
De Gendt, Stefan
;
Kilchytska, V.
;
Jurczak, Gosia
;
Flandre, Denis
Journal
Microelectronic Engineering
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1918
since deposited on 2021-10-16
Acq. date: 2025-12-11
Citations
Metrics
Views
1918
since deposited on 2021-10-16
Acq. date: 2025-12-11
Citations