Effective mobility in FinFET structures with HfO2 and SiON gate dielectrics and TaN gate electrode

Publication:

2005

Journal article

Author(s)

Rudenko, Tamara

;

;

;

Kilchytska, V.

;

;

Flandre, Denis

Microelectronic Engineering

1920 since deposited on 2021-10-16

Acq. date: 2026-04-06