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Challenges building a 22nm node 6T-SRAM cell using immersion lithography

Date

2009
Proceedings Paper
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dc.contributor.authorErcken, Monique
dc.contributor.authorAltamirano Sanchez, Efrain
dc.contributor.authorBaerts, Christina
dc.contributor.authorBrus, Stephan
dc.contributor.authorDe Backer, Johan
dc.contributor.authorDemand, Marc
dc.contributor.authorDelvaux, Christie
dc.contributor.authorHoriguchi, Naoto
dc.contributor.authorLocorotondo, Sabrina
dc.contributor.authorVandeweyer, Tom
dc.contributor.authorVeloso, Anabela
dc.contributor.authorVerhaegen, Staf
dc.contributor.imecauthorErcken, Monique
dc.contributor.imecauthorAltamirano Sanchez, Efrain
dc.contributor.imecauthorBaerts, Christina
dc.contributor.imecauthorBrus, Stephan
dc.contributor.imecauthorDe Backer, Johan
dc.contributor.imecauthorDemand, Marc
dc.contributor.imecauthorDelvaux, Christie
dc.contributor.imecauthorHoriguchi, Naoto
dc.contributor.imecauthorLocorotondo, Sabrina
dc.contributor.imecauthorVandeweyer, Tom
dc.contributor.imecauthorVeloso, Anabela
dc.contributor.orcidimecHoriguchi, Naoto::0000-0001-5490-0416
dc.date.accessioned2021-10-17T22:07:24Z
dc.date.available2021-10-17T22:07:24Z
dc.date.embargo9999-12-31
dc.date.issued2009
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/15279
dc.source.conference6th International Symposium on Immersion Lithography Extensions
dc.source.conferencedate22/10/2009
dc.source.conferencelocationPrague Czech Republic
dc.title

Challenges building a 22nm node 6T-SRAM cell using immersion lithography

dc.typeProceedings paper
dspace.entity.typePublication
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