Publication:
Asymmetric strain relaxation in patterned SiGe layer: a means to enhance carrier mobilities in Si cap layers
Date
Loading...
Journal
Abstract
Description
Metrics
Views
1941 since deposited on 2021-10-16
Acq. date: 2025-10-23
Citations
Metrics
Views
1941 since deposited on 2021-10-16
Acq. date: 2025-10-23
Citations