Publication:
Asymmetric strain relaxation in patterned SiGe layer: a means to enhance carrier mobilities in Si cap layers
Date
| dc.contributor.author | Buca, D. | |
| dc.contributor.author | Hollander, B. | |
| dc.contributor.author | Feste, S. | |
| dc.contributor.author | Lenk, S. | |
| dc.contributor.author | Trinkaus, H. | |
| dc.contributor.author | Mantl, S. | |
| dc.contributor.author | Loo, Roger | |
| dc.contributor.author | Caymax, Matty | |
| dc.contributor.imecauthor | Loo, Roger | |
| dc.contributor.imecauthor | Caymax, Matty | |
| dc.contributor.orcidimec | Loo, Roger::0000-0003-3513-6058 | |
| dc.date.accessioned | 2021-10-16T15:13:01Z | |
| dc.date.available | 2021-10-16T15:13:01Z | |
| dc.date.issued | 2007-01 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/11824 | |
| dc.source.beginpage | 32108 | |
| dc.source.issue | 3 | |
| dc.source.journal | Applied Physics Letters | |
| dc.source.volume | 90 | |
| dc.title | Asymmetric strain relaxation in patterned SiGe layer: a means to enhance carrier mobilities in Si cap layers | |
| dc.type | Journal article | |
| dspace.entity.type | Publication | |
| Files | ||
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