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Integration of single damascene 85/85nm/L/S copper trenches in black diamond using 193nm optical lithography with dipole illumination

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dc.contributor.authorVan Olmen, Jan
dc.contributor.authorWu, Wen
dc.contributor.authorVan Hove, Marleen
dc.contributor.authorTravaly, Youssef
dc.contributor.authorBrongersma, Sywert
dc.contributor.authorEyckens, Brenda
dc.contributor.authorMaenhoudt, Mireille
dc.contributor.authorVan Aelst, Joke
dc.contributor.authorStruyf, Herbert
dc.contributor.authorDemuynck, Steven
dc.contributor.authorTokei, Zsolt
dc.contributor.authorVervoort, Iwan
dc.contributor.authorSijmus, Bram
dc.contributor.authorVos, Ingrid
dc.contributor.authorCiofi, Ivan
dc.contributor.authorStucchi, Michele
dc.contributor.authorMaex, Karen
dc.contributor.authorIacopi, Francesca
dc.contributor.imecauthorVan Olmen, Jan
dc.contributor.imecauthorBrongersma, Sywert
dc.contributor.imecauthorVan Aelst, Joke
dc.contributor.imecauthorStruyf, Herbert
dc.contributor.imecauthorDemuynck, Steven
dc.contributor.imecauthorTokei, Zsolt
dc.contributor.imecauthorVos, Ingrid
dc.contributor.imecauthorCiofi, Ivan
dc.contributor.imecauthorStucchi, Michele
dc.contributor.imecauthorMaex, Karen
dc.contributor.orcidimecBrongersma, Sywert::0000-0002-1755-3897
dc.contributor.orcidimecCiofi, Ivan::0000-0003-1374-4116
dc.date.accessioned2021-10-15T07:18:04Z
dc.date.available2021-10-15T07:18:04Z
dc.date.issued2003
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/8289
dc.source.beginpage171
dc.source.conferenceProceedings of the IEEE International Interconnect Technology Conference - IITC
dc.source.conferencedate2/06/2003
dc.source.conferencelocationSan Francisco, CA USA
dc.source.endpage173
dc.title

Integration of single damascene 85/85nm/L/S copper trenches in black diamond using 193nm optical lithography with dipole illumination

dc.typeProceedings paper
dspace.entity.typePublication
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