Metal Etch Depth Metrology using YieldStar and CDSEM

dc.contributor.author	Anunciado, Roy
dc.contributor.author	Aliaj, Ilirjan
dc.contributor.author	van Haren, Richard
dc.contributor.author	Truffert, Vincent
dc.contributor.author	Moussa, Alain
dc.contributor.author	Goossens, Danny
dc.contributor.author	Tamaddon, Amir-Hossein
dc.contributor.imecauthor	Truffert, Vincent
dc.contributor.imecauthor	Moussa, Alain
dc.contributor.imecauthor	Goossens, Danny
dc.contributor.imecauthor	Tamaddon, Amir-Hossein
dc.contributor.orcidimec	Truffert, Vincent::0000-0001-7851-830X
dc.contributor.orcidimec	Moussa, Alain::0000-0002-6377-4199
dc.contributor.orcidimec	Goossens, Danny::0009-0005-6087-6308
dc.contributor.orcidimec	Tamaddon, Amir-Hossein::0000-0003-4566-0697
dc.date.accessioned	2025-06-05T09:45:11Z
dc.date.available	2024-07-31T17:43:17Z
dc.date.available	2025-06-05T09:45:11Z
dc.date.issued	2024
dc.identifier.doi	10.1109/ASMC61125.2024.10545490
dc.identifier.eisbn	979-8-3503-8455-0
dc.identifier.isbn	979-8-3503-8456-7
dc.identifier.issn	1078-8743
dc.identifier.uri	https://imec-publications.be/handle/20.500.12860/44234
dc.publisher	IEEE
dc.source.conference	35th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC)
dc.source.conferencedate	MAY 13-16, 2024
dc.source.conferencelocation	Albany
dc.source.journal	N/A
dc.source.numberofpages	4
dc.title	Metal Etch Depth Metrology using YieldStar and CDSEM
dc.type	Proceedings paper
dspace.entity.type	Publication
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