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Chemical mechanical polishing of Ge using colloidal silica particles and H2O2
Publication:
Chemical mechanical polishing of Ge using colloidal silica particles and H2O2
Date
2011
Journal article
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Ong, Patrick
;
Peddeti, Shivaji
;
Leunissen, Peter
;
Babu, S. V.
Journal
Electrochemical and Solid-State Letters
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1897
since deposited on 2021-10-19
Acq. date: 2025-10-23
Citations
Metrics
Views
1897
since deposited on 2021-10-19
Acq. date: 2025-10-23
Citations