Publication:
Chemical mechanical polishing of Ge using colloidal silica particles and H2O2
Date
| dc.contributor.author | Ong, Patrick | |
| dc.contributor.author | Peddeti, Shivaji | |
| dc.contributor.author | Leunissen, Peter | |
| dc.contributor.author | Babu, S. V. | |
| dc.contributor.imecauthor | Ong, Patrick | |
| dc.contributor.orcidimec | Ong, Patrick::0000-0002-2072-292X | |
| dc.date.accessioned | 2021-10-19T16:53:49Z | |
| dc.date.available | 2021-10-19T16:53:49Z | |
| dc.date.issued | 2011 | |
| dc.identifier.issn | 1099-0062 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/19511 | |
| dc.identifier.url | http://scitation.aip.org/getabs/servlet/GetabsServlet?prog=normal&id=ESLEF600001400000700H254000001&idtype=cvips&gifs=yes | |
| dc.source.beginpage | 254 | |
| dc.source.endpage | 257 | |
| dc.source.issue | 7 | |
| dc.source.journal | Electrochemical and Solid-State Letters | |
| dc.source.volume | 14 | |
| dc.title | Chemical mechanical polishing of Ge using colloidal silica particles and H2O2 | |
| dc.type | Journal article | |
| dspace.entity.type | Publication | |
| Files | ||
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