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Study of design-based e-beam defect inspection for hotspot detection and process window characterization on 10nm logic device

Date

2016
Proceedings Paper
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dc.contributor.authorHalder, Sandip
dc.contributor.authorLeray, Philippe
dc.contributor.authorDi Lorenzo, Paolo
dc.contributor.authorWang, Fei
dc.contributor.authorZhang, Pengcheng
dc.contributor.authorFang, Wei
dc.contributor.authorLiu, Kevin
dc.contributor.authorJau, Jack
dc.contributor.imecauthorHalder, Sandip
dc.contributor.imecauthorLeray, Philippe
dc.contributor.orcidimecHalder, Sandip::0000-0002-6314-2685
dc.date.accessioned2021-10-23T11:06:37Z
dc.date.available2021-10-23T11:06:37Z
dc.date.embargo9999-12-31
dc.date.issued2016
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/26687
dc.identifier.urlhttp://proceedings.spiedigitallibrary.org/proceeding.aspx?articleid=2502474
dc.source.beginpage97780O
dc.source.conferenceMetrology, Inspection, and Process Control for Microlithography XXX
dc.source.conferencedate20/02/2016
dc.source.conferencelocationSan Jose, CA USA
dc.title

Study of design-based e-beam defect inspection for hotspot detection and process window characterization on 10nm logic device

dc.typeProceedings paper
dspace.entity.typePublication
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