Publication:
Mechanisms for undesired nucleation on H-terminated Si and dimethylamino-trimethylsilane passivated SiO2 during TiO2 area-selective atomic layer deposition
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Acq. date: 2025-12-15
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1180 since deposited on 2022-11-20
Acq. date: 2025-12-15
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214 since deposited on 2022-11-20
45last month
6last week
Acq. date: 2025-12-15
Views
1180 since deposited on 2022-11-20
Acq. date: 2025-12-15
Citations