Publication:
Mechanisms for undesired nucleation on H-terminated Si and dimethylamino-trimethylsilane passivated SiO2 during TiO2 area-selective atomic layer deposition
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Acq. date: 2026-07-17
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347 since deposited on 2022-11-20
10last month
9last week
Acq. date: 2026-07-17
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1181 since deposited on 2022-11-20
Acq. date: 2026-07-17
Citations