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Mechanisms for undesired nucleation on H-terminated Si and dimethylamino-trimethylsilane passivated SiO2 during TiO2 area-selective atomic layer deposition

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Acq. date: 2026-05-18

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333 since deposited on 2022-11-20
22last month
6last week
Acq. date: 2026-05-18

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1181 since deposited on 2022-11-20
Acq. date: 2026-05-18

Citations