Publication:
Mechanisms for undesired nucleation on H-terminated Si and dimethylamino-trimethylsilane passivated SiO2 during TiO2 area-selective atomic layer deposition
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138 since deposited on 2022-11-20
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1180 since deposited on 2022-11-20
1last week
Acq. date: 2025-10-29
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