Publication:

N10 SADP bulk FinFET depth micro loading improvement with bias pulsing plasma

Date

2014
Meeting abstract
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dc.contributor.authorTao, Zheng
dc.contributor.authorVos, Ingrid
dc.contributor.authorAltamirano Sanchez, Efrain
dc.contributor.authorXu, Kaidong
dc.contributor.authorHellin, David
dc.contributor.authorCamerotto, Elisabeth
dc.contributor.authorJumel, Helene
dc.contributor.authorTitus, Monica
dc.contributor.imecauthorTao, Zheng
dc.contributor.imecauthorVos, Ingrid
dc.contributor.imecauthorAltamirano Sanchez, Efrain
dc.contributor.imecauthorHellin, David
dc.contributor.imecauthorCamerotto, Elisabeth
dc.date.accessioned2021-10-22T06:26:52Z
dc.date.available2021-10-22T06:26:52Z
dc.date.issued2014
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/24600
dc.source.beginpageP14
dc.source.conferencePlasma Etch and Strip in Microtechnology - PESM
dc.source.conferencedate12/05/2014
dc.source.conferencelocationGrenoble France
dc.title

N10 SADP bulk FinFET depth micro loading improvement with bias pulsing plasma

dc.typeMeeting abstract
dspace.entity.typePublication
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