Publication:

A high-performance drying method enabling clustered single wafer wet cleaning

Date

2000
Proceedings Paper
Simple item page Full metadata Statistics
 
dc.contributor.authorMertens, Paul
dc.contributor.authorDoumen, Geert
dc.contributor.authorLauerhaas, Jeff
dc.contributor.authorKenis, Karine
dc.contributor.authorFyen, Wim
dc.contributor.authorMeuris, Marc
dc.contributor.authorArnauts, Sophia
dc.contributor.authorDevriendt, Katia
dc.contributor.authorVos, Rita
dc.contributor.authorHeyns, Marc
dc.contributor.imecauthorMertens, Paul
dc.contributor.imecauthorDoumen, Geert
dc.contributor.imecauthorKenis, Karine
dc.contributor.imecauthorMeuris, Marc
dc.contributor.imecauthorArnauts, Sophia
dc.contributor.imecauthorDevriendt, Katia
dc.contributor.imecauthorVos, Rita
dc.contributor.imecauthorHeyns, Marc
dc.contributor.orcidimecMeuris, Marc::0000-0002-9580-6810
dc.contributor.orcidimecDevriendt, Katia::0000-0002-0662-7926
dc.date.accessioned2021-10-14T13:22:36Z
dc.date.available2021-10-14T13:22:36Z
dc.date.embargo9999-12-31
dc.date.issued2000
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/4580
dc.source.beginpage56
dc.source.conferenceSymposium on VLSI Technology. Digest of Technical Papers
dc.source.conferencedate13/06/2000
dc.source.conferencelocationHonolulu, HI USA
dc.source.endpage57
dc.title

A high-performance drying method enabling clustered single wafer wet cleaning

dc.typeProceedings paper
dspace.entity.typePublication
Files

Original bundle

Name:
4577.pdf
Size:
243.63 KB
Format:
Adobe Portable Document Format
Download
Publication available in collections:
Conference contributions