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MIS or MS? Source/drain contact scheme evaluation for 7nm Si CMOS technology and beyond
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MIS or MS? Source/drain contact scheme evaluation for 7nm Si CMOS technology and beyond
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Date
2016
Proceedings Paper
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Yu, Hao
;
Schaekers, Marc
;
Demuynck, Steven
;
Barla, Kathy
;
Mocuta, Anda
;
Horiguchi, Naoto
;
Collaert, Nadine
;
Thean, Aaron
;
De Meyer, Kristin
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1813
since deposited on 2021-10-23
Acq. date: 2025-12-16
Citations
Metrics
Views
1813
since deposited on 2021-10-23
Acq. date: 2025-12-16
Citations