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Towards atomic-layer-scale processing of high mobility channel materials in acidic solutions for N5 and N7 technology nodes

Date

2016
Proceedings Paper
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dc.contributor.authorvan Dorp, Dennis
dc.contributor.authorArnauts, Sophia
dc.contributor.authorAbrenica, Graniel
dc.contributor.authorHolsteyns, Frank
dc.contributor.imecauthorvan Dorp, Dennis
dc.contributor.imecauthorArnauts, Sophia
dc.contributor.imecauthorAbrenica, Graniel
dc.contributor.imecauthorHolsteyns, Frank
dc.contributor.orcidimecvan Dorp, Dennis::0000-0002-1085-4232
dc.date.accessioned2021-10-23T16:02:00Z
dc.date.available2021-10-23T16:02:00Z
dc.date.embargo9999-12-31
dc.date.issued2016
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/27452
dc.source.beginpage51
dc.source.conferenceUltra Clean Processing of Semiconductor Surfaces XIII - UCPSS
dc.source.conferencedate11/09/2016
dc.source.conferencelocationKnokke-Heist Belgium
dc.source.endpage54
dc.title

Towards atomic-layer-scale processing of high mobility channel materials in acidic solutions for N5 and N7 technology nodes

dc.typeProceedings paper
dspace.entity.typePublication
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