Publication:

Study of thermal stability of nickel silicide by x-ray reflectivity

Date

2005
Journal article
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dc.contributor.authorVan Hove, Marleen
dc.contributor.authorTravaly, Youssef
dc.contributor.authorSajavaara, Timo
dc.contributor.authorBrijs, Bert
dc.contributor.authorVandervorst, Wilfried
dc.contributor.authorLauwers, Anne
dc.contributor.authorChamirian, Oxana
dc.contributor.authorKittl, Jorge
dc.contributor.authorJonas, Alain
dc.contributor.authorMaex, Karen
dc.contributor.imecauthorVandervorst, Wilfried
dc.contributor.imecauthorLauwers, Anne
dc.contributor.imecauthorMaex, Karen
dc.date.accessioned2021-10-16T06:13:29Z
dc.date.available2021-10-16T06:13:29Z
dc.date.issued2005
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/11406
dc.source.beginpage492
dc.source.endpage496
dc.source.issue3_4
dc.source.journalMicroelectronic Engineering
dc.source.volume82
dc.title

Study of thermal stability of nickel silicide by x-ray reflectivity

dc.typeJournal article
dspace.entity.typePublication
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