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Impact of millisecond laser anneal on the thermal stress-induced defect creation in Si1-xGex source/drain junctions

Date

2008
Meeting abstract
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dc.contributor.authorBargallo Gonzalez, Mireia
dc.contributor.authorSimoen, Eddy
dc.contributor.authorRosseel, Erik
dc.contributor.authorVerheyen, Peter
dc.contributor.authorHoffmann, Thomas Y.
dc.contributor.authorLoo, Roger
dc.contributor.authorAbsil, Philippe
dc.contributor.authorClaeys, Cor
dc.contributor.imecauthorSimoen, Eddy
dc.contributor.imecauthorRosseel, Erik
dc.contributor.imecauthorVerheyen, Peter
dc.contributor.imecauthorLoo, Roger
dc.contributor.imecauthorAbsil, Philippe
dc.contributor.orcidimecSimoen, Eddy::0000-0002-5218-4046
dc.contributor.orcidimecLoo, Roger::0000-0003-3513-6058
dc.date.accessioned2021-10-17T06:15:18Z
dc.date.available2021-10-17T06:15:18Z
dc.date.embargo9999-12-31
dc.date.issued2008
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/13343
dc.source.beginpage619
dc.source.conference213th ECS Meeting
dc.source.conferencedate18/05/2008
dc.source.conferencelocationPhoenix, AZ USA
dc.title

Impact of millisecond laser anneal on the thermal stress-induced defect creation in Si1-xGex source/drain junctions

dc.typeMeeting abstract
dspace.entity.typePublication
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