Publication:

Optimized EUV mask absorber stack for improved imaging by reducing roughness and crystallinity of alternative absorber materials

Date

2016
Proceedings Paper
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dc.contributor.authorLuong, Vu
dc.contributor.authorPhilipsen, Vicky
dc.contributor.authorHendrickx, Eric
dc.contributor.authorScholze, Frank
dc.contributor.authorvan de Kruijs, Robbert
dc.contributor.authorEdrisi, Arash
dc.contributor.authorWood, Obert
dc.contributor.authorHeyns, Marc
dc.contributor.imecauthorLuong, Vu
dc.contributor.imecauthorPhilipsen, Vicky
dc.contributor.imecauthorHendrickx, Eric
dc.contributor.imecauthorHeyns, Marc
dc.contributor.orcidimecPhilipsen, Vicky::0000-0002-2959-432X
dc.date.accessioned2021-10-23T12:21:56Z
dc.date.available2021-10-23T12:21:56Z
dc.date.issued2016
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/26933
dc.source.conferenceInternational Symposium on Extreme Ultraviolet Lithography
dc.source.conferencedate24/10/2016
dc.source.conferencelocationHiroshima Japan
dc.title

Optimized EUV mask absorber stack for improved imaging by reducing roughness and crystallinity of alternative absorber materials

dc.typeProceedings paper
dspace.entity.typePublication
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