Publication:

Implementation of templated DSA for via layer patterning at the 7 nm node

Date

2015
Proceedings Paper
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dc.contributor.authorGronheid, Roel
dc.contributor.authorDoise, Jan
dc.contributor.authorBekaert, Joost
dc.contributor.authorChan, BT
dc.contributor.authorKarageorgos, Ioannis
dc.contributor.authorRyckaert, Julien
dc.contributor.authorVandenberghe, Geert
dc.contributor.authorCao, Yi
dc.contributor.authorLin, G.
dc.contributor.authorSomervell, Mark
dc.contributor.authorFenger, Germain
dc.contributor.authorFuchimoto, Daisuke
dc.contributor.imecauthorGronheid, Roel
dc.contributor.imecauthorDoise, Jan
dc.contributor.imecauthorBekaert, Joost
dc.contributor.imecauthorChan, BT
dc.contributor.imecauthorRyckaert, Julien
dc.contributor.imecauthorVandenberghe, Geert
dc.contributor.orcidimecBekaert, Joost::0000-0003-3075-3479
dc.contributor.orcidimecChan, BT::0000-0003-2890-0388
dc.date.accessioned2021-10-22T19:31:16Z
dc.date.available2021-10-22T19:31:16Z
dc.date.embargo9999-12-31
dc.date.issued2015
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/25340
dc.identifier.urlhttp://proceedings.spiedigitallibrary.org/proceeding.aspx?articleid=2210730
dc.source.beginpage942305
dc.source.conferenceAlternative Lithographic Technologies VII
dc.source.conferencedate23/02/2015
dc.source.conferencelocationSan Jose, CA USA
dc.title

Implementation of templated DSA for via layer patterning at the 7 nm node

dc.typeProceedings paper
dspace.entity.typePublication
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