Publication:

Critical In-Line OCD Metrology for CFET Manufacturing

Date

2025
Proceedings Paper
https://doi.org/10.1117/12.3051718
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dc.contributor.authorKwon, Hyukyun
dc.contributor.authorHung, Joey
dc.contributor.authorUrbanowicz, Adam Michal
dc.contributor.authorUrenski, Ronen
dc.contributor.authorTurovets, Igor
dc.contributor.authorGer, Avron
dc.contributor.authorTseng, Szu-Wei
dc.contributor.authorSaib, Mohamed
dc.contributor.authorBogdanowicz, Janusz
dc.contributor.authorMelhem, Stephanie
dc.contributor.authorZhou, Daisy
dc.contributor.authorSiew, Yong Kong
dc.contributor.authorBasu, Debashish
dc.contributor.authorCharley, Anne-Laure
dc.contributor.authorReifsnider, Jason
dc.contributor.authorHoriguchi, Naoto
dc.contributor.authorLeray, Philippe
dc.contributor.imecauthorKwon, Hyukyun
dc.contributor.imecauthorTseng, Szu-Wei
dc.contributor.imecauthorSaib, Mohamed
dc.contributor.imecauthorBogdanowicz, Janusz
dc.contributor.imecauthorMelhem, Stephanie
dc.contributor.imecauthorZhou, Daisy
dc.contributor.imecauthorSiew, Yong Kong
dc.contributor.imecauthorBasu, Debashish
dc.contributor.imecauthorCharley, Anne-Laure
dc.contributor.imecauthorReifsnider, Jason
dc.contributor.imecauthorHoriguchi, Naoto
dc.contributor.imecauthorLeray, Philippe
dc.contributor.orcidimecKwon, Hyukyun::0000-0003-3005-0116
dc.contributor.orcidimecSaib, Mohamed::0000-0002-5153-5553
dc.contributor.orcidimecBogdanowicz, Janusz::0000-0002-7503-8922
dc.contributor.orcidimecZhou, Daisy::0000-0003-4501-8004
dc.contributor.orcidimecSiew, Yong Kong::0009-0004-1634-4163
dc.contributor.orcidimecBasu, Debashish::0009-0002-0950-9041
dc.contributor.orcidimecCharley, Anne-Laure::0000-0003-4745-0167
dc.contributor.orcidimecReifsnider, Jason::0000-0002-4248-4037
dc.contributor.orcidimecHoriguchi, Naoto::0000-0001-5490-0416
dc.contributor.orcidimecLeray, Philippe::0000-0002-1086-270X
dc.date.accessioned2025-07-28T03:57:59Z
dc.date.available2025-07-28T03:57:59Z
dc.date.issued2025
dc.description.wosFundingTextThis work is funded & supported by 14ACMOS project 14 Anstrom CMOS IC technology by the Key Digital Technologies Joint Undertaking number 101096772. This work has been enabled in part by the NanoIC pilot line. The acquisition and operation are jointly funded by the Chips Joint Undertaking, through the European Union's Digital Europe (101183266) and Horizon Europe programs (101183277), as well as by the participating states Belgium (Flanders), France, Germany, Finland, Ireland and Romania. For more information, visit nanoic-project.eu
dc.identifier.doi10.1117/12.3051718
dc.identifier.eisbn978-1-5106-8639-7
dc.identifier.isbn978-1-5106-8638-0
dc.identifier.issn0277-786X
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/45966
dc.publisherSPIE-INT SOC OPTICAL ENGINEERING
dc.source.beginpage1342606-1
dc.source.conference2025 Conference on Metrology Inspection and Process Control-Annual
dc.source.conferencedate2024-02-24
dc.source.conferencelocationSan Jose
dc.source.endpage1342606-11
dc.source.journalProceedings of SPIE
dc.source.numberofpages11
dc.subject.keywordsQUANTUM CONFINEMENT
dc.title

Critical In-Line OCD Metrology for CFET Manufacturing

dc.typeProceedings paper
dspace.entity.typePublication
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