Publication:

Design and Mask Optimization Toward Low Dose EUV Exposure

Date

2022-05-26
Proceedings Paper
https://doi.org/10.1117/12.2614268
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dc.contributor.authorXu, Dongbo
dc.contributor.authorGillijns, Werner
dc.contributor.authorKim, Ryan Ryoung han
dc.contributor.imecauthorXu, Dongbo
dc.contributor.imecauthorGillijns, Werner
dc.contributor.imecauthorKim, Ryan Ryoung han
dc.contributor.orcidimecXu, Dongbo::0000-0003-1159-2315
dc.contributor.orcidimecGillijns, Werner::0000-0002-2430-7360
dc.date.accessioned2022-09-29T15:16:38Z
dc.date.available2022-09-16T02:49:56Z
dc.date.available2022-09-20T06:56:11Z
dc.date.available2022-09-29T15:16:38Z
dc.date.issued2022-05-26
dc.identifier.doi10.1117/12.2614268
dc.identifier.eisbn978-1-5106-4980-4
dc.identifier.isbn978-1-5106-4979-8
dc.identifier.issn0277-786X
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/40430
dc.publisherSPIE-INT SOC OPTICAL ENGINEERING
dc.source.beginpage120520C
dc.source.conferenceConference on DTCO and Computational Patterning
dc.source.conferencedateAPR 24-MAY 27, 2022
dc.source.conferencelocationSan Jose, California, United States
dc.source.journalSPIE Conference proceedings
dc.source.numberofpages11
dc.source.volume12052
dc.title

Design and Mask Optimization Toward Low Dose EUV Exposure

dc.typeProceedings paper
dspace.entity.typePublication
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